Surface-textured conductive glass for solar cells, and preparation method and application thereof

ABSTRACT

Disclosed are surface-textured conductive glass for solar cells, and a preparation method and application thereof. In the surface-textured conductive glass for solar cells, a transparent conductive film is coated on a glass substrate, and the upper surface of the transparent conductive film is textured with nano/micro-scopic U-shaped pits uniformly distributed. The preparation method comprises: coating the transparent conductive film by magnetron sputtering, and then absorbing nano/micro-spheres onto the surface of the transparent conductive film as a mask by using an immersion coating method, followed by increasing the thickness of the transparent conductive film in gaps among the nano/micro-spheres by magnetron sputtering, and finally removing the nano/micro-spheres by using an ultrasonic vibration method to realize the large-scale and low-cost production of the conductive glass with nano/microscopic U-shaped surface texture. The conductive glass obtained by the method above has high repeatability, proper U-shaped texture feature size, high distribution uniformity, high production efficiency and low production cost, and thus is suitable for popularization and applications.

TECHNICAL FIELD

This invention belongs to the technical field of specialty glassproduction. It is, in detail, related to a surface-textured conductiveglass for solar cells, and preparation method and application thereof.

BACKGROUND ART

Conductive glass is a special type of glass having one side coated witha transparent conductive film, thus having features of being bothtransparent and electrically conductive. Besides being applied in LCDand warm-keeping doors and windows, conductive glass also serves as anessential part for solar cells, for it can be used as the transparentelectrode and superstrate. The photoelectric quality of the glassdirectly affects the performance of the solar cells, thus conductiveglass is a key material for preparing Amorphous Silicon,Microcrystalline Silicon, Cadmium Telluride, CIGS (Copper Indium GalliumSelenide) thin film solar cells. The issue of how to producehigh-quality low-cost surface-textured conductive glass for solar cellsis essential to produce low-cost high-efficiency solar cells forcost-effective solar power generation.

Currently, we have the following types of specialty conductive glassused for producing solar cells and their preparation methods:

1) ITO (indium tin oxide) conductive glass made by magnetron sputtering;

2) AZO (aluminum-doped zinc oxide) conductive glass made by magnetronsputtering;

3) FTO (fluorine-doped tin oxide) conductive glass made by AtmosphericPressure Chemical Vapor Deposition (APCVD);

4) BZO (boron-doped zinc oxide) or AZO (aluminum-doped zinc oxide)conductive glass made by Low Pressure Chemical Vapor Deposition (LPCVD);

To enhance light absorption, the transparent conductive film should havea certain degree of texture, namely unevenness, at nano/micro-scale, soas to enable diffuse scattering (usually measured by haze value) duringlight incidence and extend optical path for light propagation inside thecell (As shown in Draw. 1).

Among conductive glass samples in lab, we mainly have the followingthree kinds of surface texture:

1) AZO conductive glass made by hydrochloric acid wet etching aftermagnetron sputtering (as shown in Draw. 2);

2) FTO conductive glass made by APCVD (as shown in Draw. 3);

3) BZO or AZO conductive glass made by LPCVD (as shown in Draw. 4).

Meanwhile, the surface feature of the transparent conductive film mustensure that the quality of the absorption layer of the solar cellremains free of negative influences from its unevenness. As a cell isusually prepared layer-by-layer in a sequential order, the transparentconductive film serves as the direct substrate on which the absorptionlayer grows, and its shape directly affects the growth mode and thequality of the absorption layer. Taking microcrystalline siliconabsorption layers for instance (as shown in Draw. 5), different surfacetexture shapes of transparent conductive films have led tomicrocrystalline silicon absorption layers with different qualities.

When the textured surface of the transparent conductive film takes on aV-shape (Draw. 5A), the microcrystalline silicon absorption layer on topis easy to have fissure, which severely affects the performances of thesolar cells. The microcrystalline silicon absorption layer has lessfissure (Draw. 5B) or even no fissure (Draw. 5C) when the surfacetexture takes on a U-shape. Besides, cadmium telluride absorption layershave stricter requirements than microcrystalline silicon absorptionlayers on surface texture morphology, which requires the surface textureto totally consist of shallower U-shaped pits.

For the above three types of samples, only AZO conductive glass made byhydrochloric acid wet etching after magnetron sputtering and BZO (orAZO) conductive glass made by LPCVD may meet the requirement on U-shapedsurface texture morphology. During industrial volume production,however, due to the uneasy control of wet etching, problems like uneven,unstable products and low yield do exist in the former, while the laterneeds long time of plasma etching, and thus both render too high costfor industrial production. Up to now, it is still a gap in the world tofind an industrialized low-cost method to produce U-shapedsurface-textured conductive glass for microcrystalline silicon andcadmium telluride thin film solar cells. Due to facts stated above, theproduction cost for microcrystalline silicon thin film solar cellsremains high and the production of cadmium telluride thin film solarcells has only to use planar FTO conductive glass which almost has nosurface texture.

INVENTION DESCRIPTION

To overcome the shortcomings of the existing technologies, thisinvention mainly aims at providing a low-cost surface-texturedconductive glass for solar cells, having a textured surface over whichnano-scopic U-shaped pits uniformly distributed.

This invention also aims at providing a preparation method forsurface-textured conductive glass for solar cells mentioned above. Thepreparation method comprises: coating a transparent conductive film(ITO, AZO, etc.) by magnetron sputtering, then absorbingnano/micro-spheres onto the surface of the transparent conductive filmas a mask by using an immersion coating method, followed by increasingthe thickness of the transparent conductive film in gaps among thenano/micro-spheres (dia. 10 nm-100 μm) by magnetron sputtering, andfinally removing the nano/micro-spheres by mechanical or chemical meanssuch as the ultrasonic vibration method, so as to extensively realizethe low-cost production of the conductive glass with U-shaped surfacetexture.

Still, this invention aims at providing the application ofsurface-textured conductive glass for solar cells mentioned above.

The purposes of this invention can be realized via the followingtechnical solutions.

A surface-textured conductive glass for solar cells, with the followingstructure and composition: a transparent conductive film coated on aglass substrate, the upper surface of which is a textured surface withnano/micro-scopic U-shaped surface texture.

The thickness of the said transparent conductive film is 100-5,000 nm.

The said transparent conductive film adopts one of the followingmaterials: ITO, AZO or other materials (isoelectric point>3).

The preparation method of said surface-textured conductive glass forsolar cells, including the following procedures (as shown in Draw. 6):

(1) Conductive glass A is derived after coating the transparentconductive film on a glass substrate by magnetron sputtering.

(2) Prepare the monodispersed nano/micro-sphere suspension and adjustits pH value to 3-7; immerse conductive glass A in the suspension for2-15 minutes, and then take it out and wash it with water, and thenconductive glass B is derived.

Due to the fact that the transparent conductive films such as ITO andAZO have higher isoelectric points (usually 6-10), andnano/micro-spheres of silicon dioxide or polystyrene have lowerisoelectric points (usually 2-4), when the conductive glass is immersedinto the neutral (pH=7) or acidic (pH=3-6) suspension containingnano/micro-spheres, the surface of the transparent conductive filmcarries negative electrical charges while the surface of thenano/micro-spheres carry positive electrical charges, and thus theelectrostatic attraction is resulted in between the two materials. Aftercertain time, the surface of the transparent conductive film is almosttotally covered by a monolayer of nano/micro-spheres. The area coverageof nano/micro-spheres on conductive glass depends on the concentrationand the pH value of the nano/micro-sphere suspension, and the immersioncoating time.

(3) Taking nano/micro-spheres as a mask, a transparent conductive filmis coated on conductive glass B by magnetron sputtering, and thusconductive glass C is derived. The thickness of the film newly coatedshould not exceed the radius of the nano/micro-spheres, and the totalthickness of the transparent conductive film is 100-5,000 nm.

The reason for using magnetron sputtering to coat the second film againlies in that the coated materials can, during magnetron sputtering,reach the side positions below the nano/micro-spheres, and form aU-shaped textured surface without sharp edges and corners (as shown inDraw. 7).

(4) Remove the nano/micro-spheres by an ultrasonic vibration method toform a surface texture of U-shaped nano/micro-scopic pits on the surfaceof conductive glass C, and thus the surface-textured conductive glassfor solar cells is derived. The transmittance in the visible spectrum ofthe conductive glass is more than 80%, and the sheet resistance is lessthan 10 Ω.

The magnetron sputtering as stated in procedure (1) and (3) has thefollowing conditions: base vacuum pressure: <1×10⁻⁵ Torr; workingpressure: 1-10 mTorr; working gas: Ar+O₂; sputtering plasma source:direct current or radio frequency 13.56 MHz; power: 100-1,000 W;substrate temperature: 20-500° C.; deposition rate: 10-100 nm/min.

The diameters of the nano/micro-spheres as stated in procedure (2) arewithin the range of 10 nm-100 μm.

The material of the nano/micro-spheres as stated in procedure (2) iseither silicon dioxide or polystyrene.

The weight/volume (w/v) concentration of nano/micro-spheres in thesuspension as stated in procedure (2) is 0.01-1%.

The solvent of the suspension as stated in procedure (2) is water,methanol or ethanol.

The preferable immersion time for the conductive glass in the suspensionas stated in procedure (2) is 8-10 minutes.

The surface-textured conductive glass for solar cells stated above canbe used as the transparent electrode or superstrate for solar cells.

The said nano/micro-spheres in this invention refer to the nano-scopicspheres or micron-scopic spheres, and the nano/micro refers to nanometeror micrometer.

This invention has the following advantages and effects comparing withthe existing technologies:

From the angle of industrial production, the techniques adopted in thismethod, including planar glass panel magnetron sputtering, immersioncoating and cleaning, are all well matched with the presently standardindustrial processing techniques. It has the advantages of higherproducing efficiency, larger applicable glass area, higherrepeatability, and higher yield. Also, the nano/micro-spheres used areof low cost. As a result, this invention is very suitable for producingthe low-cost and high-quality conductive glass for solar cells.

DRAWING DESCRIPTION

FIG. 1 is the cross-section structure of an amorphous silicon thin filmsolar cell.

FIG. 2 is the microstructure of the textured surface in AZO conductiveglass prepared by hydrochloric acid wet etching after magnetronsputtering.

FIG. 3 is the microstructure of the textured surface in FTO conductiveglass prepared by APCVD.

FIG. 4 is the microstructure of the textured surface in BZO or AZOconductive glass prepared by LPCVD.

FIG. 5 is the comparison of the growth states of microcrystallinesilicon on different conductive glass substrates.

FIG. 6 is the schematic flow chart for preparing the surface-texturedconductive glass for solar cells in this invention.

FIG. 7 is the sketch map of the film deposition mode when coating filmsby magnetron sputtering using nano/micro-spheres as a mask.

FIG. 8 is the conductive glass coated with nano/micro-spheres inEmbodiment 1.

FIG. 9 is the conductive glass coated with nano/micro-spheres inEmbodiment 2.

FIG. 10 is the conductive glass coated with nano/micro-spheres inEmbodiment 3.

FIG. 11 is the conductive glass coated with nano/micro-spheres inEmbodiment 4.

FIG. 12 is the conductive glass coated with nano/micro-spheres inEmbodiment 5.

FIG. 13 is the conductive glass coated with nano/micro-spheres inEmbodiment 6.

FIG. 14 is the top view of the surface feature in the conductive glassafter removing nano/micro-spheres in Embodiment 1; A—magnification of10,000, B—magnification of 5,000.

FIG. 15 is the side view at 30° tilt angle of the surface feature in theconductive glass after removing nano/micro-spheres in Embodiment 1;A—magnification of 10,000, B—magnification of 5,000.

EMBODIMENTS

We hereby make more detailed descriptions of this invention incombination with embodiments and drawings, but the embodiments of thisinvention are not limited to these ones.

Embodiment 1

A preparation method for surface-textured conductive glass for solarcells, including the following procedures (As shown in Draw. 6):

(1) An AZO transparent conductive film is coated on a glass substrate bymagnetron sputtering, and conductive glass A is derived. The conditionsfor magnetron sputtering are: base vacuum pressure: 0.8×10⁻⁵ Torr;working pressure: 1 mTorr; working gas: Ar+O₂; sputtering plasma source:direct current or radio frequency 13.56 MHz; power: 1,000 W; substratetemperature: 20° C.; deposition rate: 100 nm/min;

(2) Prepare a suspension (0.25% w/v) of polystyrene nano-spheres (dia.1,000 nm) in water, and adjust its pH value to 4; immerse conductiveglass A in the suspension for 2 minutes, and then take it out and washit with water, and then conductive glass B is derived;

As shown in Draw. 8, conductive glass B is coated with a monolayer ofnano-spheres;

(3) Taking nano-spheres as a mask, an AZO transparent conductive film iscoated on conductive glass B by magnetron sputtering (the magnetronsputtering conditions are the same as those in Procedure (1)), and thusconductive glass C is derived. The thickness of the film newly coatedshould not exceed the radius of nano-spheres, and the total thickness ofthe transparent conductive film is 2,000 nm;

(4) Remove the nano-spheres deposited on the surface of the transparentconductive film by using an ultrasonic vibration method, and thus thesurface-textured conductive glass for solar cells is derived. Thesurface features of conductive glass after removing nano-spheres areshown in Draw. 14 and Draw. 15. The pits on the textured surface presenta smooth curvature and thus an obvious U-shape, and also, these pits areuniformly distributed over the surface of the conductive glass. Thetransmittance in the visible spectrum of the conductive glass is 82%,and surface resistance is 3 Ω. This conductive glass can be used as thetransparent electrode or superstrate for solar cells.

Embodiment 2

A preparation method for surface-textured conductive glass for solarcells, including the following procedures (As shown in Draw. 6):

(1) An AZO transparent conductive film is coated on a glass substrate bymagnetron sputtering, and conductive glass A is derived. The conditionsfor magnetron sputtering are: base vacuum pressure: 0.7×10⁻⁵ Torr;working pressure: 10 mTorr; working gas: Ar+O₂; sputtering plasmasource: direct current or radio frequency 13.56 MHz; power: 100 W;substrate temperature: 500° C.; deposition rate: 100 nm/min;

(2) Prepare a suspension (0.5% w/v) of silicon dioxide nano-spheres(dia. 1,000 nm) in ethanol, and adjust its pH value to 7; immerseconductive glass A in the suspension for 4 minutes, and then take it outand wash it with water, and then conductive glass B is derived;

As shown in Draw. 9, conductive glass B is coated with a monolayer ofnano-spheres;

(3) Taking nano/micro-spheres as a mask, an AZO transparent conductivefilm is coated on conductive glass B by magnetron sputtering (themagnetron sputtering conditions are the same as those in Procedure (1)),and thus conductive glass C is derived. The thickness of the film newlycoated should not exceed the radius of the nano/micro-sphere, and thetotal thickness of the transparent conductive film is 3,000 nm;

(4) Remove the nano/micro-spheres deposited on the surface of thetransparent conductive film by an ultrasonic vibration method, so as toform the surface texture consisting of U-shaped nano/micro-scopic pitson the surface of conductive glass C, and thus the surface-texturedconductive glass for solar cells is derived. The transmittance in thevisible spectrum of the conductive glass is 83%, and the sheetresistance is 4 Ω. This conductive glass can be used as the transparentelectrode or superstrate for solar cells.

Embodiment 3

A preparation method for surface-textured conductive glass for solarcells, including the following procedures (As shown in Draw. 6):

(1) An ITO transparent conductive film is coated on a glass substrate bymagnetron sputtering, and conductive glass A is derived. The conditionsfor magnetron sputtering are: base vacuum pressure: 0.9×10⁻⁵ Torr;working pressure: 4 mTorr; working gas: Ar+O₂; sputtering plasma source:direct current or radio frequency 13.56 MHz; power: 800 W; substratetemperature: 100° C.; deposition rate: 80 nm/min;

(2) Prepare a suspension (0.1% w/v) of polystyrene nano-spheres (dia.1,000 nm) in water, and adjust its pH value to 6; immerse conductiveglass A in the suspension for 6 minutes, and then take it out and washit with water, and then conductive glass B is derived;

As shown in Draw. 10, conductive glass B is coated with a monolayer ofnano-spheres;

(3) Taking nano/micro-spheres as a mask, an ITO transparent conductivefilm is coated on conductive glass B by magnetron sputtering (themagnetron sputtering conditions are the same as those in Procedure (1)),and thus conductive glass C is derived. The thickness of the film newlycoated should not exceed the radius of the nano/micro-spheres, and thetotal thickness of the transparent conductive film is 1,000 nm;

(4) Remove the nano/micro-spheres deposited on the surface of thetransparent conductive film by an ultrasonic vibration method, so as toform the surface texture consisting of U-shaped nano/micro-scopic pitson the surface of conductive glass C, and thus the surface-texturedconductive glass for solar cells is derived. The transmittance in thevisible spectrum of the conductive glass is 81%, and surface resistanceis 2 Ω. This conductive glass can be used as the transparent electrodeor superstrate for solar cells.

Embodiment 4

A preparation method for surface-textured conductive glass for solarcells, including the following procedures (As shown in Draw. 6):

(1) An AZO transparent conductive film is coated on a glass substrate bymagnetron sputtering, and conductive glass A is derived. The conditionsfor magnetron sputtering are: base vacuum pressure: 0.5×10⁻⁵ Torr;working pressure: 6 mTorr; working gas: Ar+O₂; sputtering plasma source:direct current or radio frequency 13.56 MHz; power: 200 W; substratetemperature: 400° C.; deposition rate: 40 nm/min;

(2) Prepare a suspension (0.75% w/v) of polystyrene nano-spheres (dia.1,000 nm) in water, and adjust its pH value to 3; immerse conductiveglass A in the suspension for 8 minutes, and then take it out and washit with water, and then conductive glass B is derived;

As shown in Draw. 11, conductive glass B is coated with a monolayer ofnano-spheres, the surface area coverage of which is more than 90%;

(3) Taking nano/micro-spheres as a mask, an AZO transparent conductivefilm is coated on conductive glass B by magnetron sputtering (themagnetron sputtering conditions are the same as those in Procedure (1)),and thus conductive glass C is derived. The thickness of the film newlycoated should not exceed the radius of nano/micro-spheres, and the totalthickness of the transparent conductive film is 100 nm;

(4) Remove the nano/micro-spheres deposited on the surface of thetransparent conductive film by an ultrasonic vibration method, so as toform the surface texture consisting of U-shaped nano/micro-scopic pitson the surface of conductive glass C, and thus the surface-texturedconductive glass for solar cells is derived. The transmittance in thevisible spectrum of the conductive glass is 84%, and the sheetresistance is 5 Ω. This conductive glass can be used as the transparentelectrode or superstrate for solar cells.

Embodiment 5

A preparation method for surface-textured conductive glass for solarcells, including the following procedures (As shown in Draw. 6):

(1) An AZO transparent conductive film is coated on a glass substrate bymagnetron sputtering, and conductive glass A is derived. The conditionsfor magnetron sputtering are: base vacuum pressure: 0.6×10⁻⁵ Torr;working pressure: 8 mTorr; working gas: Ar+O₂; sputtering plasma source:direct current or radio frequency 13.56 MHz; power: 400 W; substratetemperature: 300° C.; deposition rate: 20 nm/min;

(2) Prepare a suspension (1% w/v) of polystyrene nano-spheres (dia.1,000 nm) in methanol, and adjust its pH value to 3; immerse conductiveglass A in the suspension for 10 minutes, and then take it out and washit with water, and then conductive glass B is derived;

As shown in Draw. 12, conductive glass B is coated with a monolayer ofnano spheres, the surface area coverage is more than 90%;

(3) Taking nano/micro-spheres as a mask, an AZO transparent conductivefilm is coated on conductive glass B by magnetron sputtering (themagnetron sputtering conditions are the same as those in Procedure (1)),and thus conductive glass C is derived. The thickness of the film newlycoated should not exceed the radius of nano/micro-spheres, and the totalthickness of the transparent conductive film is 5,000 nm;

(4) Remove the nano/micro-spheres deposited on the surface of thetransparent conductive film by an ultrasonic vibration method, so as toform the surface texture consisting of U-shaped nano/micro-scopic pitson the surface of conductive glass C, and thus the surface-texturedconductive glass for solar cells is derived. The transmittance in thevisible spectrum of conductive glass is 82%, and the sheet resistance is3 Ω. This conductive glass can be used as the transparent electrode orsuperstrate for solar cells.

Embodiment 6

A preparation method for surface-textured conductive glass for solarcells, including the following procedures (As shown in Draw. 6):

(1) An AZO transparent conductive film is coated on a glass substrate bymagnetron sputtering, and conductive glass A is derived. The conditionsfor magnetron sputtering are: base vacuum pressure: 0.4×10⁻⁵ Torr;working pressure: 2 mTorr; working gas: Ar+O₂; sputtering plasma source:direct current or radio frequency 13.56 MHz; power: 600 W; substratetemperature: 200° C.; deposition rate: 60 nm/min;

(2) Prepare a suspension (0.01% w/v) of polystyrene nano-spheres (dia.1,000 nm) in methanol, and adjust its pH value to 4; immerse conductiveglass A in the suspension for 15 minutes, and then take it out and washit with water, and then conductive glass B is derived;

As shown in Draw. 13, conductive glass B is coated with a monolayer ofnano-spheres;

(3) Taking nano/micro-spheres as a mask, an AZO transparent conductivefilm is coated on conductive glass B by magnetron sputtering (themagnetron sputtering conditions are the same as those in Procedure (1)),and thus conductive glass C is derived. The thickness of the film newlycoated should not exceed the radius of nano/micro-spheres, and the totalthickness of the transparent conductive film is 4,000 nm;

(4) Remove the nano/micro-spheres deposited on the surface of thetransparent conductive film by an ultrasonic vibration method, so as toform the surface texture consisting of U-shaped nano/micro-scopic pitson the surface of conductive glass C, and thus the surface-texturedconductive glass for solar cells is derived. The transmittance in thevisible spectrum of the conductive glass is 82%, and the sheetresistance is 3 Ω. This conductive glass can be used as the transparentelectrode or superstrate for solar cells.

Above introduced embodiments are preferable ones for this invention, butthe implementation methods of this inventions are not limited by aboveembodiments. Any other alternation, embellishment, substitution,combination or simplification which complies with the spirit andprinciple of this invention falls into the protection of this invention.

1. A surface-textured conductive glass for solar cells, which ischaracterized in that: a transparent conductive film coated on a glasssubstrate, the upper surface of which is of a surface texture withnano/micro-scopic U-shaped pits.
 2. The surface-textured conductiveglass for solar cells as described in claim 1 is characterized in that:the thickness of said transparent conductive film is 100-5,000 nm. 3.The surface-textured conductive glass for solar cells, as described inclaim 1 or claim 2 is characterized in that: the said transparentconductive film is made either of indium tin oxide or aluminum-dopedzinc oxide.
 4. An preparation method for the said surface-texturedconductive glass for solar cells as described in claim 1 ischaracterized in that, it includes the following procedures: (1) Theconductive glass A is derived by coating a transparent conductive filmon a glass substrate by magnetron sputtering. (2) Prepare the suspensionof nano/micro-spheres and adjust its pH value to 3-7; immerse conductiveglass A in the suspension for 2-15 minutes, and then take it out andwash it with water, and then conductive glass B is derived. (3) Takingnano/micro-spheres as a mask, a transparent conductive film is coated onconductive glass B by magnetron sputtering, and thus conductive glass Cis derived. The thickness of the film newly coated should not exceed theradius of nano/micro-spheres, and the total thickness of the transparentconductive film is 100-5,000 nm. (4) Remove the nano/micro-spheresdeposited on the surface of the transparent conductive film by anultrasonic vibration method, and the surface-textured conductive glassfor solar cells is thus derived.
 5. The preparation method of thesurface-textured conductive glass for solar cells as described in claim4 is characterized in that: the magnetron sputtering as stated inprocedure (1) and (3) is performed under the following conditions: basevacuum pressure: <1×10⁻⁵ Torr; working pressure: 1-10 mTorr; workinggas: Ar+O₂; sputtering source: direct current or radio frequency 13.56MHz; power: 100-1,000 W; substrate temperature: 20-500; deposition rate:10-100 nm/min.
 6. The preparation method of the surface-texturedconductive glass for solar cells as described in claim 4 ischaracterized in that: the diameters of nano/micro-spheres which arestated in procedure (2) are 10 nm-100 μm.
 7. The preparation method ofthe surface-textured conductive glass for solar cells as described inclaim 4 is characterized in that: the material of nano/micro-spheres asmentioned in procedure (2) is either silicon dioxide or polystyrene. 8.The preparation method of the surface-textured conductive glass forsolar cells as described in claim 4 is characterized in that: Theweight/volume concentration of nano/micro-spheres in the suspension asmentioned in procedure (2) is 0.01-1%. The solvent of the suspension asmentioned in procedure (2) is either water, methanol or ethanol.
 9. Thepreparation method of the surface-textured conductive glass for solarcells, as mentioned in claim 4 is characterized in that: the immersiontime for the conductive glass in the suspension as mentioned inprocedure (2) is 8-10 minutes.
 10. The surface-textured conductive glassfor solar cells as described in claim 1 can be used as the transparentelectrode or superstrate for solar cells.